The FilmTek™ 3000M combined reflection-transmission metrology system was developed for efficient and accurate measurement of patterned films deposited on transparent substrates. The FilmTek™ 3000M utilizes allows for a small spot size down to 2 µm, and can be equipped with a large custom stage for flat panel display applications.
Conventional optical metrology systems which utilize a high power objective for sub-15µm spot measurements are prone to significant signal degradation and optical artifacts, limiting their use for patterned samples, non-uniform films, and thick films. The patented optical design of FilmTek™ 3000M maintains high signal fidelity even during small spot measurements by allowing for a sub-10µm spot with a low power objective. Avoiding the use of a high power objective is critical for limiting the angular spectrum of the collected light and maximizing the coherence of both spectral reflection and transmission.
Film thickness range: 5nm to 350µm (5nm to 150µm is standard)
Film thickness accuracy: ±1.5Å for NIST traceable standard oxide 1000Å to 1µm
CD precision (1σ): <0.2%
Spectral range: 380nm to 1700nm ( 380nm to 1000nm is standard)
Measurement spot size: 2µm (5×10µm standard with 10x objective)
Sample size: 2mm to 600mm (150mm is standard)
Spectral resolution: 0.3-2nm
Light source: Regulated halogen lamp (2,000 hrs lifetime)
Detector type: 2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR)
Computer: Multi-core processor with Windows™ 7 Operating System
Measurement time: <1 sec per site (e.g., oxide film)
