The FilmTekTM CD optical critical dimension system is SCI’s leading-edge solution for fully-automated, high-throughput CD measurement and advanced film analysis for the 1x nm design node and beyond. This system delivers real-time multi-layer stack characterization and CD measurement simultaneously, for both known and completely unknown structures.
FilmTekTM CD utilizes patented multimodal measurement technology to meet the challenging demands associated with the most complex semiconductor design features in development and production. This technology enables measurement of extremely small line widths, with high accuracy measurements in the sub-10nm range.
Film thickness range: 0Å to 150µm
Film thickness accuracy: ±1.0Å for NIST traceable standard oxide 100Å to 1µm
Spectral range: 190nm to 1000nm (220nm to 1000nm is standard)
Measurement spot size: 50 µm
Spectral resolution: 0.3nm
Light source: Regulated deuterium-halogen lamp (2,000 hrs lifetime)
Detector type: 2048 pixel Sony linear CCD array
Computer: Multi-core processor with Windows™ 7 Operating System
Measurement time: ~2 sec (e.g., oxide film)
