PL mapping device using innovative line laser technology, based on ordinary PL mapping system, can achieve the speed test of 6inch, 8inch epitaxial wafers, under the conditions of 125um spatial resolution, the average only need 6-9s can test the whole piece
The data is collected by R, θ, stored, and displayed in X, Y coordinate axes
data and images can be exported to other forms of software package
display ratio and color can be set by the user or the system default
Full spectrum scanning, simultaneous collection and display of peak wavelength, peak intensity, full width at half maximum, integrated intensity
Single-point spectrum display and storage can be performed on any point on the chip
Intensity spectra of 180 points per second or 2000 points per second can be collected
User-defined data filtering function
Statistics are displayed in numbers or in bar charts
Analysis of alloy composition
Automatic segmentation of system parameters and measurement parameters
Optional additional function options to complete the film thickness, Bragg reflector and VCSEL characteristics of the measurement
