The new OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this new mask aligner, OAI meets the growing challenge of a dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
Semi-Auto Double Side Mask Aligner
Wave length220nm-405nm
4-8inch
UV&LED Light Source
Proximity accuracy 3um
Soft contact accuracy2um
Hard contact accuracy 1um
Vacuum contact accuracy 0.8um
Autocompensation,Auto Z axis move
Can be configured as Nano Imprint tool for NIL
